NTT Demonstrates Technology to Autonomously Optimize Semiconductor Deposition With AI and Robots
NTT said its autonomous deposition platform, which combines AI and robotics, quickly optimized deposition conditions for semiconductor materials and extracted deposition rules that people can understand.
What happened
NTT said it demonstrated “interpretable autonomous deposition,” which uses AI and automation to autonomously optimize thin-film growth. The technology made the deposition-and-evaluation cycle about three times faster than before and successfully produced a single-crystal β-Ga₂O₃ thin film.
Why it matters
NTT demonstrated a system that automatically determines the next conditions based on evaluation results after deposition, and organizes the order for adjusting temperature and oxygen flow in a form people can use. For researchers, the important point is that the findings can help speed up the search for conditions for β-Ga₂O₃ thin films and can also be applied to studies of other conditions.
Sources
Translated from the Japanese original: /news/ntt-ai-kudougata-rabo-de-beta-ga2o3-seimaku-wo-jiritsu-ka-hy-3fbe7e. The Japanese version is authoritative if they differ.