· Product launches· 日本語で読む
Canon announces KrF lithography system that processes 400 wafers per hour
Canon announced the FPA-6400ES6a KrF lithography system, which processes 400 wafers per hour, and plans to launch it in Japan in December 2026.
What happened
According to ITmedia, Canon announced the new FPA-6400ES6a on November 10, 2026. The system can process 400 wafers per hour and has an overlay accuracy of 4.0 nanometers.
Sources
Translated from the Japanese original: /news/kiyanon-maiji-400-mai-shori-no-krf-rokou-souchi-fpa-6400es6a-86151b. The Japanese version is authoritative if they differ.